CY3438 Pt-plated Silicon Wafer (Pt Coated SiO2/Si Substrate)

Catalog No.	CY3438
Compositions	Pt, Ti, SiO2, Si
Size	4” Dia.
Film Thickness	SiO2 500nm (N100), Pt 150mm, Ti 20nm

Pt Coated SiO2/Si Substrate can be used in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Optical Products.

INQUIRY

Description

Specification

Pt Coated SiO2/Si Substrate Description

Pt-plated silicon wafers can be used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers. The silicon wafer of this product is generally plated with a layer of Pt with a thickness of 150nm.

Pt Coated SiO2/Si Substrate Specifications

Composition

Pt, Ti, Si, SiO2

Film

SiO2 500nm (N100),

Pt 150mm, Ti 20nm

Substrate Size

4" diameter

Pt Coated SiO2/Si Substrate Applications

Widely used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers.

Pt Coated SiO2/Si Substrate Packaging

Our Pt Coated SiO2/Si Substrate is carefully handled during storage and transportation to preserve the quality of our product in its original condition.