CY3436 Gold-plated Silicon Wafer (Au/Ti Coated SiO2/Si Substrate)

Catalog No.	CY3436
Compositions	Au, Ti, SiO2, Si
Resistivity	1-20 ohm.cm
Polishing	One side polished
Substrate Size	100/50mm diameter, Thickness 0.525 mm/0.279mm
Surface roughness	< 10 A RMS

Au/Ti Coated SiO2/Si Substrate can be used in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Optical Products.

INQUIRY

Description

Specification

Au/Ti Coated SiO2/Si Substrate Description

Gold-plated silicon wafers can be used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers. The silicon wafer of this product is generally plated with a layer of Ti with a thickness of 2nm, and then with a gold film of 50nm.

Au/Ti Coated SiO2/Si Substrate Specifications

Composition	Au, Ti, SiO2, Si
Film	Au(111)=50 nm Ti=2 nm SiO2=300 nm Si(100) P type B doped ~525 um Prime Grade
Resistivity	1-20 ohm.cm
Substrate Size	100/50mm diameter, Thickness 0.525 mm/0.279mm
Polish	One side polished
Surface roughness	< 10 A RMS
Maximum Thermal Budget of Au film:	below 200 ℃

Au/Ti Coated SiO2/Si Substrate Applications

Widely used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers.

Au/Ti Coated SiO2/Si Substrate Packaging

Our Au/Ti Coated SiO2/Si Substrate is carefully handled during storage and transportation to preserve the quality of our product in its original condition.