CY3439 Ag-plated Silicon Wafer (Ag/Cr Coated SiO2/Si Substrate)

Catalog No.	CY3439
Compositions	Ag, Cr, SiO2, Si
Coating thickness	Cr 2-7nm Ag 50nm
Size	4”, 50mm, 100mm Dia, or customized
Thickness	0.525mm, 0.279mm
Polishing	One side polished

Ag/Cr Coated SiO2/Si Substrate can be used in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Optical Products.

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Description

Specification

Ag/Cr Coated SiO2/Si Substrate Description

Ag/Cr Coated SiO2/Si Substrate can be used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers. The silicon wafer of this product is generally plated with a layer of Cr with a thickness of 2-7nm, and then with a layer of Ag with a thickness of 50nm.

Ag/Cr Coated SiO2/Si Substrate Specifications

Composition	Ag, Cr, SiO2, Si
Coating Thickness	Cr 2-7nm Ag 50nm
Substrate Size	4”, 50mm, 100mm Dia, or customized
Thickness	0.525mm, 0.279mm

Ag/Cr Coated SiO2/Si Substrate Applications

Widely used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers.

Ag/Cr Coated SiO2/Si Substrate Packaging

Our Ag/Cr Coated SiO2/Si Substrate is carefully handled during storage and transportation to preserve the quality of our product in its original condition.