Description of Lithium Fluoride Crystals Substrates
Lithium Fluoride Crystals (LiF) belong to the cubic system, and the cleavage plane is the (100) plane, which has excellent optical properties, especially in the deep ultraviolet range. With the development of deep ultraviolet technology in recent years, Lithium Fluoride Crystals are widely used for deep ultraviolet, due to their high transmittance in the deep ultraviolet region and short cutoff wavelengths.
Specification of Lithium Fluoride Crystals Substrates
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The main performance parameters
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Crystal Structure
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Cubic
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Lattice Constants
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4.02 A
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Density
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2.65 (g/cm3)
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Melting Point
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884 °C
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Growth Method
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Bridgeman
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Mohs Hardness
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3 Mohs
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Coefficient of thermal expansion
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3.195 x 10-6/°C //c
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Refractive Index
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No=1.394; Ne=1.394
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Transmission Band
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0.11-6.5um
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Standard Orientation
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<100>, <110>, <111>
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Standard Size
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5x5mm, 10x10mm, Dia1"(25.4mm), Dia4"(100mm)
Or according to customer's requirements
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Standard Thickness
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0.5mm, 1.0mm, 2.0mm, 5.0mm
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LiF Crystal Application
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IR and UV windows, prism and substrate
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Polishing
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Single side polished or Double side polished
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Surface Quality
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Epi-polished (Roughness: Ra<5A (5 x 5um))
Optical polished (Surface finish: 60-40, 40-20 or others)
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Applications of Lithium Fluoride Crystals Substrates
With the development of deep ultraviolet technology in recent years, Lithium Fluoride Crystals Substrates are widely used for deep ultraviolet, due to their high transmittance in the deep ultraviolet region and short cutoff wavelengths.
Package of Lithium Fluoride (LiF) Crystal Substrates
Lithium Fluoride (LiF) Crystal Substrates are meticulously packaged with anti-static protective layers, moisture-resistant sealing, and shock-absorbing materials to ensure safe transit and storage. Each package includes detailed labeling and documentation to meet international shipping standards.
FAQs
Q1 What is the transparency range of LiF crystal substrates?
Lithium Fluoride crystals are highly transparent in the range of 120 nm (vacuum ultraviolet) to 10 µm (infrared), making them suitable for a variety of optical applications.
Q2 Are LiF crystal substrates suitable for high-temperature applications?
Yes, LiF substrates can withstand high temperatures up to 600°C, making them ideal for laser systems and high-temperature thin-film deposition.
Q3 Are LiF substrates suitable for X-ray and VUV applications?
Yes, LiF substrates are widely used in X-ray imaging and vacuum ultraviolet (VUV) applications due to their excellent transmission and low absorption in these wavelength ranges.
