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VD0807 Titanium Silicide (TiSi2) Evaporation Materials

Catalog No. VD0807
Material Titanium Silicide (TiSi2)
Purity 99.5%
Shape Powder/ Granule/ Custom-made

As a distinguished manufacturer and supplier, Stanford Advanced Materials (SAM) takes pride in offering high-purity Titanium Silicide Evaporation Materials in various shapes, including tablets, granules, rods, and wires. Our commitment extends to customizing forms and quantities to align with specific application needs.

Related products: Nickel Titanium (Ni/Ti) Evaporation MaterialsTitanium (Ti) Evaporation MaterialsAluminum Titanium (Al/Ti) Evaporation MaterialsChromium Titanium (Cr/Ti) Evaporation MaterialsCobalt Titanium (Co/Ti) Evaporation Materials

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Description
Specification
Technical Data Sheet

Titanium Silicide Evaporation Materials Description

Titanium Silicide Evaporation Material, provided by Stanford Advanced Materials, is a silicide ceramic evaporation material with the chemical formula TiSi. High-purity TiSi evaporation materials play a significant role in deposition processes, ensuring the creation of top-tier deposited films. Stanford Advanced Materials (SAM) excels in producing evaporation materials with purity levels reaching up to 99.9995%, employing stringent quality assurance processes to ensure exceptional product reliability.

Titanium Silicide Evaporation Materials Specification

Specification Description
Material Type Titanium silicide
Symbol TiSi
Appearance/Color Dark grey solid
Melting Point 1,425 °C (2,597 °F; 1,698 K)
Density 4.55 g/cm³
Purity 99.9%
Available Shapes Powder, Granule, Custom-made

Titanium Silicide Evaporation Materials Application

Titanium Silicide (TiSi2) Evaporation Materials have a wide range of applications in the semiconductor industry. They are commonly used to prepare metal silicide films, which play an important role in CMOS (Complementary Metal-Oxide-Semiconductor) devices and other integrated circuits. TiSi2 films have good electrical conductivity, thermal and chemical stability, making them ideal for metal linkages, resistive layers and conductors. In addition, TiSi2 films are used in solar cells, thermoelectric elements and other high-temperature applications, where they are favored for their excellent oxidation and heat resistance.

Titanium Silicide Evaporation Materials Packaging

To ensure streamlined identification and quality control, Titanium Silicide Evaporation Materials are meticulously tagged and externally labeled. We exercise utmost care to prevent any potential damage that might occur during storage or transportation.

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    Purity

    99.9%

    • 99.9%
    • 99%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Quantity

    500gram

    • 500gram
    • 50gram
    • 100gram
    • 1kg
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