Terbium Manganate Sputtering Target Description
Terbium Manganate Sputtering Target is composed of terbium, manganese, and oxygen. High-purity terbium manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Terbium Manganate Sputtering Target Specification
Material Type |
Terbium Manganate |
Symbol |
TbMnO3 |
Color/Appearance |
Solid |
Melting Point |
/ |
Density |
7.35 g/cm3 |
Type of Bond |
Elastomer, Indium |
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Terbium Manganate Sputtering Target Application
Terbium Manganate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Terbium Manganate Sputtering Target Packaging
Our Terbium Manganate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
Specification
Material Type |
Terbium Manganate |
Symbol |
TbMnO3 |
Color/Appearance |
Solid |
Melting Point |
/ |
Density |
7.35 g/cm3 |
Type of Bond |
Elastomer, Indium |
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.