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ST0414 Barium Oxide Sputtering Target, BaO

Catalog No. ST0414
Chemical Formula BaO
CAS Number 1304-28-5
Purity 99.5%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The barium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality barium oxide sputter targets at the most competitive prices.

Related products: Barium (Ba) Evaporation Materials, Barium Titanate (BaTiO3) Evaporation Materials

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Description
Specification
Technical Data Sheet

Barium Oxide Sputtering Target Description

Barium oxide sputtering target is a type of oxide ceramic sputtering target composed of Barium and oxide. Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty.

Barium Oxide Sputtering Target Manufacturing Process

• Manufacturing – Cold pressed – Sintered, Elastomer bonded to the backing plate

• Cleaning and final packaging, Cleaning for use in vacuum, Protection from environmental contaminants, Protection during shipment.

Barium Oxide Sputtering Target Specification

Material Type Barium Oxide
Symbol BaO
Color/Appearance White, Crystalline Solid
Melting Point 1,923°C
Sputter RF, RF-R, DC
Type of Bond Indium, Elastomer
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Barium Oxide Sputtering Target Applications

Barium oxide sputtering targets are essential materials utilized in physical vapor deposition (PVD) processes. They find widespread applications in thin film fabrication, particularly in the manufacturing of optical films and electronic devices. Major applications include optical coating, lens coatings, optical filters, and semiconductor device fabrication.

Barium Oxide Sputtering Target Bonding Services

Indium Bonding and Elastomeric Target Bonding Services are available for the barium oxide sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company to provide bonding services. For questions about target bonding materials, methods, and services, please click here.

Barium Oxide Sputtering Target Packing

Our barium oxide sputtering target is tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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