Sputtering targets are available monoblock or bonded with dimensions and configurations up to 820 mm, and are produced with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices and the latest processing equipment, such as large area coating and flip-chip applications. Research-sized targets are also available, as are custom sizes and alloy compositions.
Sputtering targets are available monoblock or bonded with dimensions and configurations up to 820 mm and are produced with hole drill locations and threading, beveling, grooves, and backing designed to work with both older sputtering devices and the latest processing equipment, such as large area coating and flip-chip applications. Research-sized targets are also available, as are custom sizes and alloy compositions.
We understand the importance of reliable and consistent materials to our customers' R&D and production needs, so we have established solid relationships with our manufacturers. By frequently visiting our manufacturers and talking with their management, production, QC engineers, and workers in production lines about the quality we seek, we create truly working partnerships. It is these valued friendships, built over many years, that allow us to supply consistent and high-quality products to our customers over the world. SAM's motto is "We not only provide products, but we also provide satisfaction." We trust you will find SAM one of your favorite suppliers.
Stanford Advanced Materials is now striving to supply our customers with high-quality and reliable sputtering targets at very competitive prices. The website www.sputtertargets.net is one of our subsidiary websites, full-heartedly designed for sputtering targets. It offers more detailed specifications for all products and services. For more information, you can reach us at E-mail: target@samaterials.com or call us at Tel: (949) 407-8904. You are also welcome to visit our web pages at www.sputtertargets.net for information about our products, services, pricing, and news.
Why Choose SAM for Sputtering Targets?
At SAM (Stanford Advanced Materials), we understand the critical role that sputtering targets play in thin film deposition processes. With our commitment to quality, technical expertise, and customer satisfaction, we are your trusted partner in sourcing sputtering targets that meet the highest standards of precision and performance.
Key Advantages:
Comprehensive Selection: Our collection comprises an extensive range of sputtering targets, each meticulously crafted for specific applications. From metals and alloys to ceramics and compounds, our offerings enable you to choose the ideal target material for your deposition needs.
Thin Film Excellence: We recognize that thin film deposition is at the forefront of technological innovation. Our sputtering targets are engineered to deliver thin films of exceptional quality, uniformity, and adherence.
Precision in Design: Quality is the foundation of our sputtering targets. We adhere to strict industry standards and meticulous specifications, ensuring that our targets consistently yield precise and reproducible results.
Technical Expertise: Our team of experts possesses profound knowledge in thin film deposition and sputtering technology. We offer personalized technical support and guidance to assist you in selecting the optimal target for your specific requirements.
Custom Solutions: We understand that each deposition process is unique. Our flexible approach allows us to customize sputtering target solutions to precisely match your thin film deposition parameters.
Our Sputtering Targets Offerings:
SAM offers an array of sputtering targets, each characterized by its exceptional properties and potential applications. Our offerings include, but are not limited to:
Metal Sputtering Targets: Discover a wide variety of metal targets suitable for depositing thin films in electronics, optics, energy, and more.
Alloy Sputtering Targets: Explore alloy targets designed to impart specific characteristics and functionalities to thin films, enhancing their performance in diverse applications.
Ceramic Sputtering Targets: Experience the precision of ceramic targets, vital for producing thin films with exceptional hardness, wear resistance, and thermal properties.
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