ST0228 Tantalum Carbide Sputtering Target, TaC
| Catalog No. | ST0228 |
| Chemical Formula | TaC |
| CAS Number | 12070-06-3 |
| Purity | 99.5% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Tantalum Carbide Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality Tantalum Carbide Sputter Targets at the most competitive prices.
INQUIRY
Add to Inquiry List
Description
Specification
Tantalum Carbide Sputtering Target Description
Tantalum Carbide Sputtering Target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula TaC.
Tantalum is a chemical element that originated from King Tantalus, father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum. Its atomic number in the periodic table of elements is 73 with a location at Period 6 and Group 5, belonging to the d-block. The relative atomic mass of tantalum is 180.94788(2) Dalton, the number in the brackets indicating the uncertainty.
Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.
Tantalum Carbide Sputtering Target Handling Notes
1. Indium bonding is recommended for Tantalum Carbide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.
Tantalum Carbide Sputtering Target Packaging
Our Tantalum Carbide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
LATEST RECOMMENDED
ST0414 Barium Oxide Sputtering Target, BaO
ST0416 Cesium Sputtering Target, Cs
ST0424 Fluorine Doped Tin Oxide FTO Sputtering Target
ST0434 Cobalt Ferrite Sputtering Target, CoFe2O4
ST0443 Lanthanum Copper Oxide Sputtering Target, La2CuO4
ST0444 Lanthanum Ferrite Sputtering Target, LaFeO3
ST0453 Lithium Silicate Sputtering Target, Li4SiO4
ST0460 Neodymium Nickel Oxide Sputtering Target, NdNiO3
GET A QUOTE
Send us an Inquiry now to find out more Information and the latest prices,thanks!