Tantalum Sputtering Target, Ta | Stanford Advanced Materials

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ST1051 Tantalum Sputtering Target (Ta Sputtering Target)

Catalog No.	ST1051
Material	R05200; R05400
Standard	ASTM B708-2001
Purity	≥99.95%, 99.99%9, 99.999%
MSDS/SDS	Download MSDS/SDS

Stanford Advanced Materials (SAM) offers high-quality Tantalum Sputtering Targets, crafted using only the finest Tantalum Disks. These targets are precision-made for superior performance in a range of applications, ensuring reliability and consistent results.

Other tantalum products: tantalum foil / tantalum strip, tantalum sheet / tantalum plate, tantalum tube / tantalum pipe, tantalum wire, etc.

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Description

Specification

Technical Data Sheet

Video

Tantalum Sputtering Target Description

Stanford Advanced Materials (SAM) is renowned for providing high-quality Tantalum Sputtering Targets. These meticulously crafted targets are made from exceptionally pure tantalum, ensuring a consistent and reliable composition. The material's remarkable density enhances sputtering efficiency and results in improved film adhesion. Tantalum's exceptional thermal stability allows the targets to withstand extreme heating during sputtering, making them suitable for a range of high-temperature processes. Moreover, the material's exceptional corrosion resistance ensures the targets maintain their integrity, even under the most challenging sputtering conditions—the low levels of impurities and gas content in the tantalum result in superior film quality and uniformity. Additionally, the material's ease of machining allows for precise shaping according to specific application needs. Thanks to these exceptional properties, Tantalum Sputtering Targets have become the material of choice for depositing tantalum films in a range of industries, including electronics, optics, thin-film solar energy, and magnetic storage. Their adaptability and reliability make them a vital component in numerous sputtering deposition processes.

ta planar target ta revolving target

Tantalum Sputtering Target Specifications

Part No.	Material	Size	Purity
TA0201	Tantalum	1.00" Dia. x 0.125" Thick	99.95%
TA0202	Tantalum	1.00" Dia. x 0.250" Thick	99.95%
TA0203	Tantalum	2.00" Dia. x 0.125" Thick	99.95%
TA0204	Tantalum	2.00" Dia. x 0.250" Thick	99.95%
TA0205	Tantalum	3.00" Dia. x 0.250" Thick	99.95%
TA0206	Tantalum	3.00" Dia. x 0.250" Thick	99.95%
TA0207	Tantalum	4.00" Dia. x 0.250" Thick	99.95%
TA0208	Tantalum	4.00" Dia. x 0.250" Thick	99.95%
TA0209	Tantalum	5.00" Dia. x 0.250" Thick	99.95%
TA0210	Tantalum	5.00" Dia. x 0.250" Thick	99.95%

Need a tailor-made solution? Contact us.

We also provide high-quality Tantalum Disc.

Other information for your reference
Chemical Composition:

Element	R05200 (%,Max)	R05400 (%,Max)
C	0.01	0.01
O	0.015	0.03
N	0.01	0.01
H	0.0015	0.0015
Fe	0.01	0.01
Mo	0.02	0.02
Nb	0.1	0.1
Ni	0.01	0.01
Si	0.005	0.005
Ti	0.01	0.01
W	0.05	0.05

Tantalum and Tantalum Alloy

R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both
R05400, unalloyed tantalum, powder-metallurgy consolidation.
R05255, tantalum alloy, 90 % tantalum, 10 % tungsten, electron-beam furnace of vacuum-arc melt, or both.
R05252, tantalum alloy, 97.5 % tantalum, 2.5 % tungsten, electron-beam furnace or vacuum-arc melt, or both.
R05240, tantalum alloy, 60 % tantalum, 40 % niobium, electron-beam furnace or vacuum-arc melt.

Tantalum Sputtering Target Applications

1. Electronics: Tantalum Sputtering Targets are widely used in the electronics industry for the deposition of tantalum films in integrated circuits, capacitors, and other microelectronic components. The high purity and corrosion resistance of tantalum makes it an ideal material for these applications.

2. Optics: Tantalum Sputtering Targets are also used in the optical industry for the deposition of tantalum films on optical components, such as lenses and mirrors. The high transparency and hardness of tantalum make it suitable for this application.

3. Thin-film solar energy: Tantalum Sputtering Targets are employed in the production of thin-film solar cells. The deposition of tantalum films on solar cells enhances their efficiency and reliability.

4. Magnetic storage: In the magnetic storage industry, Tantalum Sputtering Targets are used to deposit tantalum films on magnetic disks and tapes, improving their durability and performance.

5. Decorative coatings: Due to the attractive appearance of tantalum, Tantalum Sputtering Targets are also used in the production of decorative coatings for various consumer products, such as jewelry and watches.

Tantalum Sputtering Target Packaging

Our tantalum sputtering targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Material Safety Data Sheet (MSDS) for your reference!

Specification

Part No.	Material	Size	Purity
TA0201	Tantalum	1.00" Dia. x 0.125" Thick	99.95%
TA0202	Tantalum	1.00" Dia. x 0.250" Thick	99.95%
TA0203	Tantalum	2.00" Dia. x 0.125" Thick	99.95%
TA0204	Tantalum	2.00" Dia. x 0.250" Thick	99.95%
TA0205	Tantalum	3.00" Dia. x 0.250" Thick	99.95%
TA0206	Tantalum	3.00" Dia. x 0.250" Thick	99.95%
TA0207	Tantalum	4.00" Dia. x 0.250" Thick	99.95%
TA0208	Tantalum	4.00" Dia. x 0.250" Thick	99.95%
TA0209	Tantalum	5.00" Dia. x 0.250" Thick	99.95%
TA0210	Tantalum	5.00" Dia. x 0.250" Thick	99.95%