ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3
| Catalog No. | ST0515 |
| Chemical Formula | HfO2/Y2O3 |
| Purity | 99.9%, 99.99%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
SAM’s Hafnium Oxide with Yttrium Oxide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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