/ {{languageFlag}}
Select Language
{{item.label}}

NK3861 Nickel Telluride CVD Film (NiTe2)

Catalog No. NK3861
Type Single crystal grains
Substrate Material SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.
Size 10*10, 15*15, 20*20 mm
Method Chemical Vapor Deposition (CVD)

We provide Nickel Telluride CVD Films on various substrates, such as SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Nickel Telluride CVD Film.

Related products: Tungsten Diselenide CVD Film (WSe2), Bismuth Selenide CVD Film (Bi2Se3), Tin Diselenide Saphire Film (SnSe2)

INQUIRY
Add to Inquiry List
sc/1640314479-normal-Nickel Telluride CVD Film.jpg
sc/1640314479-normal-Nickel Telluride CVD Film.jpg
Description
Specification
Technical Data Sheet

GET A QUOTE

Send us an Inquiry now to find out more Information and the latest prices,thanks!

* Your Name
* Your Email
* Product
* Phone Number
* Country

United States

    Comments
    * Check Code
    Leave A Message
    Leave A Message
    * Your Name:
    * E-mail:
    * Product name:
    * Phone Number:
    * Message: