Hafnium Boride Evaporation Materials Description
Hafnium boride evaporation material from Stanford Advanced Materials is an oxide evaporation material with the chemical formula HfB2. High purity HfB2 evaporation materials play a huge role in deposition processes to ensure high-quality deposited film.
Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity evaporating materials using quality assurance processes to guarantee product reliability.
Hafnium Boride Evaporation Materials Specification
Compound Formula |
HfB2 |
Appearance |
Brown to black Solid |
Density |
10.5 g/cm3 |
Melting Point |
3,250° C |
Shape |
Powder/ Pellets/ Granule/ Custom-made |
Hafnium Boride Evaporation Materials Application
Hafnium boride evaporation materials are used in the following applications:
• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
• Used for optics including wear protection, decorative coatings, and displays.
Hafnium Boride Evaporation Materials Packaging
Hafnium boride evaporation materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.