Hafnium Silicide Evaporation Materials Description
Hafnium Silicide Evaporation Material, provided by Stanford Advanced Materials, represents a remarkable silicide ceramic evaporation material with the chemical formula HfSi2. The significance of high-purity HfSi2 evaporation materials in deposition processes cannot be understated, as they ensure the deposition of top-quality films. Stanford Advanced Materials (SAM) specializes in producing evaporation materials boasting purity levels of up to 99.9995%, backed by stringent quality assurance processes that guarantee the utmost product reliability.
Hafnium Silicide Evaporation Materials Specification
Specification |
Description |
Material Type |
Hafnium(IV) Silicate |
Symbol |
HfSi2 |
Appearance/Color |
Tetragonal crystal |
Melting Point |
2,758 °C (4,996 °F; 3,031 K) |
Density |
7.0 g/cm³ |
Purity |
99.5% |
Available Shapes |
Powder, Granule, Custom-made |
Hafnium Silicide Evaporation Materials Application
Hafnium Silicide Evaporation Materials find widespread application in deposition processes, spanning semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). Their primary utility lies in the realm of optics, encompassing wear protection, decorative coatings, and advancements in display technologies.
Hafnium Silicide Evaporation Materials Packaging
At Stanford Advanced Materials (SAM), we prioritize efficient identification and quality control of our Hafnium Silicide Evaporation Materials. These materials are meticulously tagged and externally labeled, reflecting our commitment to avoiding any potential damage during storage or transportation.