WM1244 (Discontinued) Ion Implantation Components (Tungsten)
| Catalog No. | WM1244 |
| Material | Tungsten and Tungsten Alloy |
| Purity | ≥98% |
| CAS Number | 7440-33-7 |
| Shape | Customized |
| Temperature Range(F) | 1000-3000°С |
| MSDS/SDS |
(Discontinued)
Ion implantation is an important process that is widely used in semiconductor device fabrication. Stanford Advanced Materials (SAM) provides customized ion implantation components with high quality and competitive prices.
Related products: ion implantation components (Molybdenum), ion implantation components (TZM)
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Description
Specification
Ion Implantation Components (Tungsten) Description:
Ion implantation is an important process that is widely used in semiconductor device fabrication, metal finishing, and materials science research. The components of ion implantation are often made of TZM, molybdenum, tungsten because these materials could perform well in harsh environments.
Ion Implantation Components (Tungsten) Applications:
• Used to manufacture semiconductors.
• Used in metal finishing for tool steel toughening and surface finishing.
• Used in ion beam mixing to achieve graded interface and strengthen adhesion between immiscible material.
Ion Implantation Components (Tungsten) Specifications:
Customized
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