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OP5084 CVD Diamond Wafer

Catalog No. OP5084
Type single crystal grains Substrate: SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.
Size 10*10, 15*15, 20*20 (mm)
Growth Method Microwave Plasma Chemical Vapor Deposition (MPCVD)

CVD Diamond Wafer is a new material with excellent optical and thermal conductive properties. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality CVD Diamond wafers.

Related products: Lithium Tantalate Wafers, Silicon Carbide Wafer, Infrared Crystal Silicon (Si Crystal), Sapphire Epitaxial Wafer EPI Wafer

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Description
Specification

CVD Diamond Wafer Description

CVD Diamond Wafer has outstanding physical and chemical properties. It has an almost continuous band of optical transparency from UV to THz. Diamond is one type of carbon and has the highest hardness and thermal conductivity at the same time with high wear resistance, chemical inertness, and excellent radiation resistance. CVD Diamond Wafer can be used in multiple band ranges such as X-ray, ultraviolet, infrared, microwave, and so on.

It plays an important role in high energy input, low dielectric loss, high Raman gain, low beam distortion, erosion resistance, and other aspects that can’t be replaced by general optic materials. CVD Diamond Wafers are the best thermal management material for high heat flux devices due to their excellent thermal conductivity.

CVD Diamond Wafer Specifications

Grade

Optical Grade

Heat Sink Grade

-

Polycrystal

Monocrystal

Polycrystal

Monocrystal

Growth Method

MPCVD

MPCVD

MPCVD

MPCVD

Size (mm)

Φ50~Φ150

≥8 in light direction

Φ50~Φ150

≥10

Luminousness

(%, 1mm thickness)

>60%@λ>500nm

>70%@λ>10μm

>65%@λ>500nm

>71%@λ>10μm

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/

Absorption Coefficient (cm-1)

<0.12@λ=1.06μm

<0.07@λ=10.6μm

<0.10@λ=1.06μm

<0.05@λ=10.6μm

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/

Thermal Conductivity (W/mk@300K)

>1800

>2200

>1200

>1500

Thermal Expansion Coefficient (10-6/K@300K)

1.0

1.0

1.0

1.0

Dielectric Constant

5.5±0.2@140GHz

/

/

/

Dielectric Loss

<6*10-5@GHz

/

/

/

Vickers Hardness (GPa)

80

70~120

80

70~120

Thickness (mm)

≥1

/

≥0.2

≥0.1

Thickness Tolerance (mm)

±0.03

±0.03

±0.03

±0.03

Parallelism (μm/cm)

≤5

≤4

/

/

Flatness PV Value (fringe/cm@633nm)

≤1

≤1/3

/

/

Roughness (nm)

≤10

≤2

≤30

≤30

Warp (μm/cm)

≤4

/

/

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CVD Diamond Wafer Application

CVD Diamond Wafer plays an important role as an important optical module in industry, aerospace, military, and other fields. CVD Diamond Wafer is also one of the best thermal management materials used in high power, high frequency, miniaturized, and highly integrated electronic components. Some classic application cases are kilowatt-level CO2 laser output coupler, beam splitter and exit windows, Raman laser, Brillouin laser, infrared optical window for infrared guidance, radar GaN RF device heat dissipation, and so on.

CVD Diamond Wafer Packaging

Our CVD Diamond Wafer is carefully handled during storage and transportation to preserve the quality of our product in its original condition.

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