Niobium Targets (Nb Targets) Description
Niobium Targets (Nb Targets) are available in various forms, purities, sizes, and prices. They are used for thin film deposition, typically for fuel cells, decoration, semiconductors, display, LED and photovoltaic devices, glass coating, etc.
Niobium Targets (Nb Targets) Specification
Niobium Targets (Nb Targets) Sizes:
Material: RO4200, RO4210
Size:
|
Circular Disc/targets
|
Diameter: 10-400mm
Thickness: 2-28mm
|
|
Rectangular Disc/targets
|
Thickness: 1mm up to 20.32mm
Width: up to 800mm
Length: up to 3000mm
|
Purity: 99.9%
Niobium Targets (Nb Targets) Technology Parameter:
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Recrystallization
|
95%min
|
|
Grain size
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ASTM 4 or finer
|
|
Surface finish
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16Rms max. or Ra 0.4 ( RMS64 or better)
|
|
Flatness
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0.1mm or 0.15% max
|
|
Tolerance
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+/-0.010" on all dimensions
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Niobium Targets (Nb Targets) Application
Niobium targets are essential in the production of thin films for electronics, optical coatings, and superconducting materials. They are used in sputtering and evaporation processes to create high-performance layers on semiconductors, solar cells, and optical lenses. Their superior properties ensure durability and efficiency in advanced technological applications.
Specification
Niobium Targets (Nb Targets) Sizes:
Material: RO4200, RO4210
Size:
|
Circular Disc/targets
|
Diameter: 10-400mm
Thickness: 2-28mm
|
|
Rectangular Disc/targets
|
Thickness: 1mm up to 20.32mm
Width: up to 800mm
Length: up to 3000mm
|
Purity: 99.9%
Niobium Targets (Nb Targets) Technology Parameter:
|
Recrystallization
|
95%min
|
|
Grain size
|
ASTM 4 or finer
|
|
Surface finish
|
16Rms max. or Ra 0.4 ( RMS64 or better)
|
|
Flatness
|
0.1mm or 0.15% max
|
|
Tolerance
|
+/-0.010" on all dimensions
|
