VD0772 Aluminum Fluiride (AlF3) Evaporation Materials

Aluminum Fluoride Evaporation Materials Description

Embark on a journey to uncover the exceptional attributes of Aluminum Fluoride Evaporation Materials and explore their diverse applications across various industries. This page provides insights into the key characteristics and applications of integrating Aluminum Fluoride into thin film deposition processes.

Aluminum Fluoride Evaporation Materials Specification

Aluminum Fluoride Evaporation Materials Key Characteristics

• Chemical Composition: Aluminum Fluoride (AlF3) is composed of aluminum (Al) and fluorine (F), forming a distinct white, crystalline solid.

• Sublimation Melting Point: AlF3 sublimes at a melting point of 1,290 °C (2,350 °F; 1,560 K), transitioning directly from solid to vapor during thermal evaporation.

• Density: The density of Aluminum Fluoride varies depending on hydration, with 3.10 g/cm3 for anhydrous, 2.17 g/cm3 for monohydrate, and 1.914 g/cm3 for trihydrate forms.

Aluminum Fluoride Evaporation Materials Applications

1. Optical Coatings: Aluminum Fluoride thin films are employed in optical coatings for lenses, mirrors, and various optical components. Its refractive properties contribute to managing light transmission and reflection.

2. Aluminum Production: In the aluminum smelting process, Aluminum Fluoride acts as a flux to lower the melting point of aluminum oxide, facilitating the extraction of aluminum.

3. Catalysts: Aluminum Fluoride is used as a catalyst in various chemical processes, contributing to improved reaction rates and selectivity.

Unlock the potential of Aluminum Fluoride Evaporation Materials and leverage their exceptional properties for innovative applications across industries.

Aluminum Fluoride Evaporation Materials Packing

Our Aluminum Fluoride (AlF3) Evaporation Materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage caused during storage or transportation.