Zirconium Sputtering Target Introduction
Zirconium (Zr) is a silver metal with a density of 6.52 g/cm3. Zr has a very small neutron absorption cross-section and relatively high melting point (1855 °C or 3371 °F), making zirconium a great material for nuclear power rods. Zirconium sponge and crystal bars are the raw materials to make sputtering targets. Although Zr sponge is cheap and has low purity, it contains a high oxygen content. Zirconium crystal bars have a higher cost and purity, making them ideal materials for sputtering targets.
Both Zr and Hf can be applied in nuclear industries. However, they have different properties in neutron capture. Although they have a lot similar properties, they need to be separated using the liquid extraction method or distillation of molten salt. We provide two grades of high purity zirconium targets: low hafnium (250ppm, or 0.025%) and high hafnium.
Zirconium Sputtering Target Applications
1. Semiconductor Manufacturing: Utilized in the deposition of zirconium thin films onto semiconductor substrates during the fabrication of integrated circuits (ICs), microchips, and other electronic components. Zirconium sputtering targets help create thin films with precise thickness and uniformity, crucial for the performance and reliability of semiconductor devices.
2. Optical Coatings: Used in the production of optical coatings for lenses, mirrors, and other optical components in industries such as telecommunications, aerospace, and scientific research. Zirconium thin films deposited by sputtering targets enhance the optical properties of surfaces, such as reflectivity and light transmission, for various applications.
3. Surface Engineering: Employed in surface modification processes, including the deposition of zirconium coatings for enhancing the wear resistance, corrosion resistance, and biocompatibility of materials. Zirconium sputtering targets enable the deposition of thin films with tailored properties to meet specific requirements in industries such as automotive, medical, and aerospace.
4. Thin Film Solar Cells: Utilized in the production of thin film solar cells, where zirconium-based materials serve as buffer layers, transparent conductive oxides, or back contacts to improve the efficiency and performance of solar panels. Zirconium sputtering targets play a crucial role in depositing these thin film layers with precise control over composition and thickness.
Zirconium Sputtering Target Specification
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Name
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Zirconium
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Symbol
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Zr
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Atomic Number
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40
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Atomic Mass
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91.224 amu
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Melting Point
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1852.0 °C (2125.15 °K, 3365.6 °F)
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Boiling Point
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4377.0 °C (4650.15 °K, 7910.6 °F)
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Classification
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Transition Metal
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Crystal Structure
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Hexagonal
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Color
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Grayish
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Thermal Conductivity
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22.7 W/m.K
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Coefficient of Thermal Expansion
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5.7 x 10-6/K
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Theoretical Density (g/cc)
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6.49
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Zirconium Sputtering Target Packaging
Our Zirconium sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
Zirconium Sputtering Target FAQs
Can zirconium sputtering targets be alloyed or doped?
Yes, zirconium targets can be alloyed or doped with other elements, such as yttrium or niobium, to modify their properties for specialized applications.
Do zirconium sputtering targets require backing plates?
Depending on the sputtering system and application, zirconium targets can be bonded to copper backing plates to improve heat dissipation and stability.
Related articles:
What Is Zirconium Used For? Nuclear And More
Where Zirconium is Used
Separation of Zirconium and Hafnium
The Application of Zirconium Products
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