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ITO0491 Indium Tin Oxide (ITO) Sputtering Targets

Catalog No. ITO0491
Material 90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity >=99.99%
CAS Number 50926-11-9
Density 7.1g/cm3
Melting Point 1565℃

Deposited by magnetron or other sputtering techniques, Indium Tin Oxide (ITO) target is used for the ITO coated substrates including electrodes for flat panel displays, touch panel contacts, energy saving automobile and building window glass, optoelectronic devices, solar panels, etc. Stanford Advanced Materials provide high-quality ITO targets with different dimensions to our customers.

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ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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