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  • ITO0491 Indium Tin Oxide (ITO) Sputtering Targets

    • ITO0491 Indium Tin Oxide (ITO) Sputtering Targets

    Catalog No. ITO0491
    Material 90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
    Purity >=99.99%
    CAS Number 50926-11-9
    Density 7.1g/cm3
    Melting Point 1565℃

    Deposited by magnetron or other sputtering techniques, Indium Tin Oxide (ITO) target is used for the ITO coated substrates including electrodes for flat panel displays, touch panel contacts, energy saving automobile and building window glass, optoelectronic devices, solar panels, etc. Stanford Advanced Materials provide high-quality ITO targets with different dimensions to our customers.

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    ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
    ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
    ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
    ITO0491 Indium Tin Oxide (ITO) Sputtering Targets
    Description
    Specification

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
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      Diameter

      2''

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      Thickness

      0.25''

      • 0.25''
      • 0.125''
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      Bonding

      Yes

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