VD0806 Tantalum Silicide Evaporation Materials, TaSi2

Catalog No.	VD0806
Material	Tantalum Silicide (TaSi2)
Purity	99.5%
Shape	Powder/ Granule/ Custom-made

Stanford Advanced Materials (SAM) specializes in producing high purity Tantalum Silicide Evaporation Materials. We offer our evaporation materials in powder and granule form. Customized forms are also available upon request.

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Description

Specification

Technical Data Sheet

Tantalum Silicide Evaporation Materials Description

High purity evaporation materials play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.95% purity tantalum silicide evaporation materials using quality assurance processes to guarantee product reliability.

Tantalum Silicide Evaporation Materials Specification

CAS No.	12039-79-1
Molecular Weight	237.12 g/mol
Melting Point	2200℃
Density	9.14g/cm3
Resistivity	8.5 (ρ/μΩ.cm)
InChI Key	MANYRMJQFFSZKJ-UHFFFAOYSA-N

Tantalum Silicide Evaporation Materials Application

• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)
• Used for optics including wear protection, decorative coatings, and displays.

Tantalum Silicide Evaporation Materials Packaging

Our tantalum silicide evaporation materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.